Effect of Applied Voltage on Growth of Micro and Nano Copper Wires in Etched Cellulose Nitrate Ion Track Detector
Paper ID : 1046-ICNS
Authors:
Banin Shakeri Jooybari *
Physics & Accelerators Research School, Nuclear Science and Technology Research Institute(NSTRI), PO Box 14395-836, Tehran, Iran
Abstract:
In this paper, micro and nano copper wires were synthesized in etched ion- track membrane by electrochemical method. 96 µm Celloluse Nitrate Nuclear Track Detectors were irradiated at UNILAC (GSI, Darmstadt) with 238U ions (kinetic energy 17.7 MeV/u, density 104-105 Ions/cm2). By chemical etching of latent tracks created by the ions, templates containing cylindrical pores with a diameter of several hundred nm to several microns in length and the thickness of the detectors were prepared. These etched ion-track membranes have been used as a template for fabrication of micro and nano copper wires. The electrochemical growth of copper wires was performed in a homemade design electrolytic cell. Deposition of copper wires in pores was performed potentiostatically in a two-electrode arrangement electrochemical cell. In addition, data analysis system was designed and then constructed. The electrical current during the filling of pores and growth of wires in electrochemical system were monitored and recorded by data analysis system that connected to computer. The lengths of fabricated wires were 96 µm, corresponding to the thickness of membranes.The influence of deposition parameter such as applied Voltage on Cu micro-wire structure and current-time curve recorded during the electrodeposition of wires were studied.
Keywords:
nuclear track detector; Cu micro-wires; electrochemical deposition method
Status : Abstract Accepted (Oral Presentation)